| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition that can obtain a pattern with excellent resolution. <P>SOLUTION: An resist composition comprises: a resin which has an acid-labile group, and is soluble in an aqueous alkali solution by an action of an acid; an acid generator; and a compound represented by formula (I'), where the resin includes a structural unit derived from a compound represented by formula (a2-0). <P>COPYRIGHT: (C)2012,JPO&INPIT |
