发明名称 ドーズ量の補正マップの作成方法、露光方法及び半導体装置の製造方法
摘要 <p>According to one embodiment, a method for making a correction map of a dose amount of EUV light used when exposing with the EUV light, includes estimating an exposure result based on an initial correction map of the dose amount and flare of the EUV light, determining a goodness of the exposure result, and correcting the initial correction map in the case where the exposure result is unacceptable. And, the correcting of the initial correction map, the estimating of the exposure result, and the determining of the goodness are repeated until the exposure result is good.</p>
申请公布号 JP5642101(B2) 申请公布日期 2014.12.17
申请号 JP20120065750 申请日期 2012.03.22
申请人 株式会社東芝 发明人 小池 貴;水野 央之;岡本 陽介
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
代理机构 代理人
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