发明名称 METHOD FOR FILLING RECESSES USING PRE-TREATMENT WITH HYDROCARBON-CONTAINING GAS
摘要 <p>The present invention provides a method for filling the recesses of a substrate with an insulation layer which includes the steps of: (i) exposing the surfaces of the recesses of the substrate to a pre-deposition gas of a reactive state in a reaction space to treat the surface with reactive hydrocarbons generated from the pre-deposition gas including at least one hydrocarbon unit in a molecule without filling the recesses; and (ii) depositing a flowable insulation layer on the surface of the substrate using a different processing gas except the pre-deposition gas to fill the recesses which are treated in the step (i) by plasma reaction.</p>
申请公布号 KR20140143694(A) 申请公布日期 2014.12.17
申请号 KR20140060120 申请日期 2014.05.20
申请人 ASM IP HOLDING B.V. 发明人 NAKANO AKINORI;UEDA SHINTARO
分类号 H01L21/205;H01L21/31;H01L21/768 主分类号 H01L21/205
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