| 摘要 |
A curable and patternable ink, a method of using this ink as part of a structure that performs a function in an electronic device, and a soft lithographic method for forming said structure on a substrate for use within the electronic device is disclosed. The curable and patternable ink generally comprises a first portion defined by structural units of (R)SiO3/2; a second portion defined by structural units of (R)2SiO2/2; and an organic solvent. Alternatively, the ink further comprises structural units (R)3SiO1/2 or SiO4/2. The R group is independently selected to be an aryl group, a methyl group, or a cross-linkable group with the number of aryl groups being present in an amount that ranges from at least one aryl group up to 20 mole %. The patternable ink may be applied to a substrate using a soft lithographic process with good reproducibility of the applied pattern. |
