| 摘要 |
The present invention is related to device for moving a substrate holder, which comprises at least a substrate to be treated, during a vertical galvanic metal, preferably copper, deposition on such a substrate to be treated characterized in that the device comprises at least a first driving means, at least a second driving means, at least a first adjusting means and at least a second adjusting means; wherein the first driving means is in operative connection to the first adjusting means to generate a first axial deflection and the second driving means is in operative connection to the second adjusting means to generate a second axial deflection of the substrate holder; wherein said first axial deflection and said second axial deflection are continuously adjustable and/or controllable. The invention is further related to a method for vertical galvanic metal, preferably copper, deposition on a substrate using such a device. |
