发明名称 |
Deposition of photovoltaic thin films by plasma spray deposition |
摘要 |
In particular embodiments, a method is described for depositing thin films, such as those used in forming a photovoltaic cell or device. In a particular embodiment, the method includes providing a substrate suitable for use in a photovoltaic device and plasma spraying one or more layers over the substrate, the grain size of the grains in each of the one or more layers being at least approximately two times greater than the thickness of the respective layer. |
申请公布号 |
US8912618(B2) |
申请公布日期 |
2014.12.16 |
申请号 |
US201313775676 |
申请日期 |
2013.02.25 |
申请人 |
AQT Solar, Inc. |
发明人 |
Bartholomeusz Brian Josef;Bartholomeusz Michael |
分类号 |
H01L31/00 |
主分类号 |
H01L31/00 |
代理机构 |
Mattingly & Malur, PC |
代理人 |
Mattingly & Malur, PC |
主权项 |
1. A photovoltaic device, comprising:
a substrate; a bottom contact layer positioned over the substrate; one or more semiconducting absorber layers positioned over the bottom contact layer; a top contact layer positioned over the absorber layer; and wherein one or more of the bottom contact layer, one or more semiconducting absorber layers, or top contact layer have an average grain size that is at least ten times larger than the thickness of the respective layer. |
地址 |
Sunnyvale CA US |