发明名称 Electro-deposition of nano-patterns
摘要 The present disclosure generally relates to techniques for electro-depositing nano-patterns. More specifically, systems and methods for fabricating periodic structures in complex nano-patterns are described. An electrical signal may be applied to one or more electrodes that are positioned about a surface of a substrate. The periodicity of the deposited pattern may be influenced by one or more parameters associated with an applied electrical signal, including one or more of frequency, amplitude, period, duty cycle, etc. The weight of each deposited line on the substrate may be influenced by the described parameters, and the shape of the pattern may be influenced by the number, shape, and position of electrodes.
申请公布号 US8911607(B2) 申请公布日期 2014.12.16
申请号 US200912512823 申请日期 2009.07.30
申请人 Empire Technology Development LLC 发明人 Kruglick Ezekiel
分类号 C25D17/12;C25D5/02;C25D5/18 主分类号 C25D17/12
代理机构 Dorsey & Whitney LLP 代理人 Dorsey & Whitney LLP
主权项 1. A method for electro-depositing a desired pattern on a surface of a substrate comprising: providing a substrate in contact with an electrolyte solution containing a material for electroplating; positioning a plurality of shaped electrodes at different locations on the surface of the substrate in a closed loop configuration, wherein a polarity associated with the plurality of electrodes is arranged to alternate along the closed loop configuration; and applying an electrical current signal to at least one of the plurality of electrodes, wherein applying an electrical current signal to the at least one electrode generates equi-potential lines and forms a conductive path along the closed loop configuration, wherein the electro-depositing occurs along the equi-potential lines resulting in a pattern extending along the equipotential lines in a plane parallel to a plane defined by the surface of the substrate, and wherein the pattern includes a curved line.
地址 Wilmington DE US