| 发明名称 |
ANTIMONY-FREE PHOTOCURABLE RESIN COMPOSITION AND THREE DIMENSIONAL ARTICLE |
| 摘要 |
The present invention provides a low viscosity photocurable composition including (i) a cationically curable component (ii) a free radically active component (iii) an antimony- free cat ionic photoinitiator and (v) a free radical photoinitiator. The photocurable composition can be cured using rapid prototyping techniques to form three-dimensional articles which can be used in various aerospace and investment casting applications. |
| 申请公布号 |
CA2626327(C) |
申请公布日期 |
2014.12.16 |
| 申请号 |
CA20062626327 |
申请日期 |
2006.10.26 |
| 申请人 |
HUNTSMAN ADVANCED MATERIALS (SWITZERLAND) GMBH |
发明人 |
FONG, JOHN WAI;LEYDEN, RICHARD;MESSE, LAURENCE;PATEL, RANJANA C.;CHAPELAT, CAROLE |
| 分类号 |
C08L33/04;A61L27/14;A61L29/04;B29C35/08;B29C67/00;C08F2/50;C08J3/28;C08L71/02;C08L83/04;G03F7/004 |
主分类号 |
C08L33/04 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
