| 发明名称 | Electron beam focusing electrode and electron gun using the same | ||
| 摘要 | An electron beam focusing electrode and an electron gun using the same may include a plate having a polygonal through-hole; at least a projecting portion formed on at least one side of the through-hole. By using the electron beam focusing electrode, a spreading phenomenon of an electron beam having a rectangular cross section may be reduced. Further, the output of the electron gun may be increased, and electron beams may be easily focused. | ||
| 申请公布号 | US8912505(B2) | 申请公布日期 | 2014.12.16 |
| 申请号 | US201213644890 | 申请日期 | 2012.10.04 |
| 申请人 | Samsung Electronics Co., Ltd.;Seoul National University Industry Foundation | 发明人 | Baik Chan Wook;Srivastava Anurag;Kim Jong Min;Kim Sun Il;Son Young Mok;Park Gun Sik;So Jin Kyu |
| 分类号 | G21K5/04;H01J1/46;H01J1/13;G21K1/087;H01J1/30 | 主分类号 | G21K5/04 |
| 代理机构 | Harness, Dickey & Pierce, P.L.C. | 代理人 | Harness, Dickey & Pierce, P.L.C. |
| 主权项 | 1. An electron beam focusing electrode, comprising: a focusing plate having a polygonal through-hole and configured to receive an applied voltage; and a projecting portion formed on at least one side of the through-hole. | ||
| 地址 | Gyeonggi-do KR | ||