发明名称 Dual port memory cell
摘要 A multi-port memory cell is disclosed that includes first and second cross-coupled inverter circuits. The input node of each inverter circuit is coupled to the output node of the other inverter circuit to receive the inverted output of the other inverter circuit. The multi-port memory cell includes a first pair of access transistors of a first type, each coupled to the input node of a respective one of the first and second inverter circuits. The multi-port memory cell also includes a second pair of access transistors of the second type, each coupled to the input of a respective one of the first and second inverter circuits. The multi-port cell exhibits advantages in layout compactness and SEU tolerance.
申请公布号 US8913455(B1) 申请公布日期 2014.12.16
申请号 US201313953390 申请日期 2013.07.29
申请人 Xilinx, Inc. 发明人 Camarota Rafael C.
分类号 G11C8/00;G11C7/10;G11C11/00;H01L21/8238;G11C11/412 主分类号 G11C8/00
代理机构 代理人 Maunu LeRoy D.
主权项 1. A multi-port memory cell, comprising: first and second inverter circuits, each inverter circuit including a pull-up transistor of a first type and a pull-down transistor of a second type; wherein in each inverter circuit: a gate of the pull-up transistor and a gate of the pull-down transistor are each coupled to a first node and receive the same voltage potential,a source of the pull-up transistor and a drain of the pull-down transistor are coupled in series and provide an inverted output at a second node between the pull-up and pull-down transistors, andthe first node of each inverter circuit is coupled to the second node of the other inverter circuit to receive the inverted output of the other inverter circuit; a first pair of access transistors of the first type, each coupled to the first node of a respective one of the first and second inverter circuits; a second pair of access transistors of the second type, each coupled to the first node of a respective one of the first and second inverter circuits; a substrate; a plurality of well regions in the substrate and extending in parallel in a first direction (y); each of the plurality of well regions having a respective set of fin structures disposed on the region, each fin structure in the respective set extending in the first direction (y); and a plurality of gate structures, each gate structure disposed over one or more of the sets of fin structures and extending in a second direction (x) that is perpendicular to the first direction (y), the fin structures and gate structures configured and arranged to form the FinFETs.
地址 San Jose CA US