发明名称 Substrate treatment installation with adjustable thermal insulation for controlling substrate temperature
摘要 A substrate-treatment installation includes a vacuum chamber, a substrate treatment device within the vacuum chamber, a substrate transport device within the vacuum chamber for guiding a substrate along a longitudinal direction in a substrate transport plane past the substrate treatment device, and a device for controlling substrate temperature. The substrate temperature controlling device includes a heat-absorbing cooler on one side of the substrate transport plane and an insulation member selectively displaceable between at least two different positions to vary extent of thermal shielding of the heat-absorbing cooler relative to the substrate transport plane by the insulation member.
申请公布号 US8911231(B2) 申请公布日期 2014.12.16
申请号 US201013376465 申请日期 2010.06.18
申请人 VON ARDENNE Anlagentechnik GmbH 发明人 Von Der Waydbrink Hubertus;Meyer Thomas;Hentschel Michael;Bauer Reinhardt;Wolf Andrej;Hecht Hans-Christian
分类号 F24J3/00;F27D1/12;F27D9/00;C23C14/54;C23C14/56 主分类号 F24J3/00
代理机构 Heslin Rothenberg Farley & Mesiti P.C. 代理人 Heslin Rothenberg Farley & Mesiti P.C.
主权项 1. A substrate treatment installation comprising: a vacuum chamber, a substrate treatment device within the vacuum chamber, a substrate transport device within the vacuum chamber for transporting a substrate along a longitudinal direction in a substrate transport plane past the substrate treatment device, and a substrate temperature controlling device within the vacuum chamber for controlling temperature of the substrate, the substrate temperature controlling device comprising cooling means for absorbing heat on one side of the substrate transport plane, and insulation means selectively displaceable between at least two different operative positions to vary extent of thermal shielding of the cooling means relative to the substrate transport plane, by the insulation means.
地址 Dresden DE