Chucking system with recessed support feature

摘要

In an imprint lithography system, a recessed support on a template chuck may alter a shape of a template positioned thereon providing minimization and/or elimination of premature downward deflection of outer edges of the template in a nano imprint lithography process.

主权项

1. A chucking system, comprising:
a template chuck having a holding support section and a recessed support section, the recessed support section cincturing the holding support section, with the holding support section having a plurality of lands for supporting a template, the lands extending a first height from the template chuck, and the recessed support section having at least one recessed land for supporting a template, the recessed land extending a second height from the template chuck, wherein the second height is substantially less than the first height.