| 发明名称 | Silicon dioxide dispersion comprising polyol | ||
| 摘要 | Stable, pourable silicon dioxide dispersion, in which the average, number-related aggregate diameter of the silicon dioxide particles in dispersion is less than 200 nm, and which comprises at least 35 wt. % of a silicon dioxide powder, 3 to 35 wt. % of at least one polyol, 20 to 60 wt. % of water, 0 to 10 wt. % of an additive and a substance having an alkaline action in an amount such that a pH of 10<pH<12 is established. It can be prepared by a procedure in which silicon dioxide powder is introduced into water and a polyol in a rotor/stator machine, the pH being less than 5, and the mixture is dispersed until the current uptake of the rotor/stator machine is largely constant, and a substance having an alkaline action is subsequently added in an amount such that a pH of the dispersion of 10<pH<12 results, the substance having an alkaline reaction being added so rapidly that no gel formation takes place. It can be used as a component of a flame-retardant filling of hollow spaces between building components, in particular for insulating glass arrangements. | ||
| 申请公布号 | US8911638(B2) | 申请公布日期 | 2014.12.16 |
| 申请号 | US200511571441 | 申请日期 | 2005.06.16 |
| 申请人 | Degussa AG | 发明人 | Lortz Wolfgang;Batz-Sohn Christoph;Mangold Helmut;Perlet Gabriele;Will Werner;Reitz Sascha |
| 分类号 | E04B1/74;C01B33/12;C01B33/148;B32B17/06;C09C1/30 | 主分类号 | E04B1/74 |
| 代理机构 | Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P. | 代理人 | Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P. |
| 主权项 | 1. A process for the preparation of a pourable silicon dioxide dispersion, comprising: supplying water, at least one polyol and optionally an additive from a reservoir and circulating the mixture of the water and polyol via a rotor/stator machine; while the rotor/stator is running, continuously or discontinuously introducing via a filling device a silicon dioxide powder to the mixture of the water and polyol; closing said filling device and continuing the dispensing until the current uptake of the rotor/stator machine is largely constant; and then adding an amount of a substance having an alkaline action so that a dispersion pH of 10<pH≦12 results, said substance having an alkaline action being added such that no gel formation takes place; to obtain said silicon dioxide dispersion which is stable and pourable; wherein an average, number-related aggregate diameter of silicon dioxide particles in dispersion is less than 200 nm, said pourable silicon dioxide dispersion comprising: at least 35 wt. % of said silicon dioxide powder, based on the total amount of the dispersion, 10 to 35 wt. % of said at least one polyol, based on the total amount of the dispersion, 20-55 wt. % of water, based on the total amount of the dispersion, 0 to 10 wt. % of an additive, based on the total amount of the dispersion, and said substance having an alkaline action in an amount so that a pH of 10<pH≦12 is established; and wherein said silicon oxide dispersion is pourable at room temperature. | ||
| 地址 | Duesseldorf DE | ||