Dual hexagonal shaped plasma source

摘要

A plasma source includes a hexagonal hollow cathode, the cathode including six targets and six magnets to generate and maintain a high density plasma; and an anode located beneath the cathode. A second hexagonal hollow cathode can be positioned concentric to the hexagonal hollow cahode.

主权项

1. A plasma source, comprising:
a first hexagonal hollow cathode, the cathode including six targets arranged in a hexagonal shape and one or more magnets associated with each of the six targets to generate and maintain a high density plasma; a second hexagonal hollow cathode including six targets arranged in a hexagonal shape located concentric to the first hexagonal hollow cathode and one or more magnets associated with each of the six targets; and an anode located opposite the cathode,wherein
each target having one or more magnets with a single radially oriented polarity with respect to the first and second concentric hexagonal hollow cathodes; the magnetic field lines of the first and second hexagonal hollow cathode couple to each other; and plasma ions impact the six targets of each hexagonal hollow cathode, thereby enhancing the erosion profile of the six targets.