| 发明名称 | Polyacetal resin composition | ||
| 摘要 | A polyacetal resin composition obtained by compounding 0.01 to 10.0 parts by weight of sterically hindered phenol (B) and 0.001 to 5 parts by weight of magnesium hydroxide (C) having a BET specific surface area of 20 m2/g or lower and an average particle diameter of 2 μm or less relative to 100 parts by weight of a polyacetal resin (A). | ||
| 申请公布号 | US8912258(B2) | 申请公布日期 | 2014.12.16 |
| 申请号 | US201113634070 | 申请日期 | 2011.03.11 |
| 申请人 | Mitsubishi Gas Chemical Company, Inc. | 发明人 | Kobayashi Daisuke;Ito Akira |
| 分类号 | C08K5/34;C08K5/3492;C08K5/3435;C08K3/10;C08K5/13;C08L59/02;C08K3/22;C08L79/04;C08L77/00 | 主分类号 | C08K5/34 |
| 代理机构 | Sughrue Mion, PLLC | 代理人 | Sughrue Mion, PLLC |
| 主权项 | 1. A polyacetal resin composition obtained by compounding 0.01 to 10.0 parts by weight of sterically hindered phenol (B) and 0.001 to 5 parts by weight of magnesium hydroxide (C) having a BET specific surface area of 20 m2/g or lower and an average particle diameter of 2 μm or less relative to 100 parts by weight of a polyacetal resin (A). | ||
| 地址 | Tokyo JP | ||