POLISHING COMPOSITION AND POLISHING METHOD

摘要

Disclosed is a polishing composition comprising: an agent for preventing the deterioration of a pad, which is selected from diethylenetriaminepentaacetic acid, hydroxyethylethylenediaminetriacetic acid, triethylenetetraminehexaacetic acid and glutamic acid diacetate, and alkali metal salts and ammonium salts of these compounds; and an oxidizing agent. Preferably, the polishing composition further comprises at least one component selected from a phenolic compound, a phosphoric acid salt and an abrasive grain. Preferably, the polishing composition is used in combination with a suede-type polishing pad.