发明名称 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME, AND MICRO PROCESSOR, PROCESSOR, SYSTEM, DATA STORAGE SYSTEM AND MEMORY SYSTEM INCLUDING THE SEMICONDUCTOR DEVICE
摘要 <p>Provided are a semiconductor device and a method for manufacturing the same. The semiconductor device according to an embodiment of the present invention includes: an interlayer dielectric which is arranged on a substrate and has a recess exposing a part of the substrate; a lower contact which buries a part of the recess; a lower layer which buries at least the residual part of the recess on the lower contact; and a variable resistance element which is arranged on the lower part and includes a residual layer protruding from the interlayer dielectric.</p>
申请公布号 KR20140142929(A) 申请公布日期 2014.12.15
申请号 KR20130064700 申请日期 2013.06.05
申请人 SK HYNIX INC. 发明人 LEE, MIN SUK;PARK, CHAN SIK;KIM, JAE HEON;KIM, CHOI DONG
分类号 H01L27/115;H01L21/8247;H01L27/105 主分类号 H01L27/115
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