发明名称 |
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME, AND MICRO PROCESSOR, PROCESSOR, SYSTEM, DATA STORAGE SYSTEM AND MEMORY SYSTEM INCLUDING THE SEMICONDUCTOR DEVICE |
摘要 |
<p>Provided are a semiconductor device and a method for manufacturing the same. The semiconductor device according to an embodiment of the present invention includes: an interlayer dielectric which is arranged on a substrate and has a recess exposing a part of the substrate; a lower contact which buries a part of the recess; a lower layer which buries at least the residual part of the recess on the lower contact; and a variable resistance element which is arranged on the lower part and includes a residual layer protruding from the interlayer dielectric.</p> |
申请公布号 |
KR20140142929(A) |
申请公布日期 |
2014.12.15 |
申请号 |
KR20130064700 |
申请日期 |
2013.06.05 |
申请人 |
SK HYNIX INC. |
发明人 |
LEE, MIN SUK;PARK, CHAN SIK;KIM, JAE HEON;KIM, CHOI DONG |
分类号 |
H01L27/115;H01L21/8247;H01L27/105 |
主分类号 |
H01L27/115 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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