发明名称 PLASMA GENERATION DEVICE, VAPOR DEPOSITION DEVICE, AND VAPOR DEPOSITION METHOD
摘要 <p>There is provided a plasma generation apparatus capable of forming plasma suitable for a plasma assist method. The plasma generation apparatus includes a chamber 2, a plasma gun 3 arranged so as to face an inside of the chamber 2, and having a cathode 7 for emitting electrons and a convergent coil 11 for forming a magnetic flux to guide the electrons emitted by the cathode 7, and an auxiliary magnet 4 for forming a magnetic flux in the chamber 2, in which an excitation current is applied to the convergent coil 11 so as to vary a direction of the magnetic flux.</p>
申请公布号 KR20140143072(A) 申请公布日期 2014.12.15
申请号 KR20137031520 申请日期 2013.02.27
申请人 CHUGAI RO CO., LTD. 发明人 FURUYA EIJI;AKANO SHINYA
分类号 H05H1/50;C23C14/32;C23C14/48 主分类号 H05H1/50
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