RESIST COMPOSITION, COMPOUND, POLYMER COMPOUND, AND RESIST PATTERN FORMING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a resist composition, a compound, a polymer compound, and a resist pattern forming method.SOLUTION: The resist composition contains a compound (m0). [In the formula (m0), Rbis an electron-withdrawing group; Rband Rbeach independently represent an aryl group, an alkyl group, or an alkenyl group which may have a substituent; Rband Rbmay be bonded to each other to form a ring with a sulfur atom in the formula; and X0is a monovalent counter anion.]