| 摘要 |
<p>The present invention relates to a brush aging device for cleaning a semiconductor wafer. According to the embodiment of the present invention, suggested is the brush aging device for cleaning the semiconductor wafer which is replaced to minimize a wafer defect generated when cleaning the semiconductor wafer. The brush aging device for cleaning the semiconductor wafer according to the embodiment of the present invention includes a brush, a whetstone, a handle, a storage tank, a rectifying device, and a transfer pump.</p> |
