发明名称 |
METHOD FOR PATTERNING GRAPHENE USING LASER |
摘要 |
<p>Suggested is a method for patterning graphene using laser, capable of forming a graphene circuit without an additional reduction process using laser patterning. An environmental problem, processing time, and equipment investment are reduced by forming the graphene circuit with high quality without additional patterning and reduction processes using the laser. Also, a fine circuit is advantageously formed using the laser in comparison with an existing pad print method and an existing inkjet print method.</p> |
申请公布号 |
KR20140142382(A) |
申请公布日期 |
2014.12.12 |
申请号 |
KR20130061714 |
申请日期 |
2013.05.30 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
LEE, TAE HEE;BA, EAH HYUN;NAM, JAE DO;OH, JOON SUK;HWANG, TAE SEON |
分类号 |
H01L21/027;B23K26/00 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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