发明名称 |
MEASUREMENT METHOD, IMAGE PROCESSING DEVICE, AND CHARGED PARTICLE BEAM DEVICE |
摘要 |
An error of an outline point due to a brightness fluctuation cannot be corrected by a simple method such as a method of adding a certain amount of offset. However, in recent years as the miniaturization of the pattern represented by a resist pattern has progressed, it has been difficult to appropriately determine a region that serves as a reference. An outline of the resist pattern is extracted from an image of the resist pattern obtained by a charged particle beam apparatus in consideration of influence of the brightness fluctuation. That is, a plurality of brightness profiles in the vicinity of edge points configuring the outline are obtained and an evaluation value of a shape of the brightness profile in the vicinity of a specific edge is obtained based on the plurality of brightness profiles, and the outline of a specific edge point is corrected, based on the evaluation value. |
申请公布号 |
KR20140142741(A) |
申请公布日期 |
2014.12.12 |
申请号 |
KR20147030585 |
申请日期 |
2013.05.27 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORPORATION |
发明人 |
OHASHI TAKEYOSHI;TANAKA JUNICHI;HOJO YUTAKA;SHINDO HIROYUKI;KAWADA HIROKI |
分类号 |
G01B15/04;H01J37/26;H01L21/66 |
主分类号 |
G01B15/04 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|