| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a mask blank capable of producing a photomask having a structure in which electrostatic discharge damage is effectively prevented.SOLUTION: An electrostatic discharge damage prevention film 2 is formed covering the entire surface on one side of a mask substrate 1, and a light-shielding film 3 is formed on the electrostatic discharge damage prevention film 2. The light-shielding film 3 is patterned to produce a photomask. The electrostatic discharge damage prevention film 2 comprises a titanium compound or a tantalum compound and has a transmittance to exposure-wavelength light of 75% or more and a sheet resistance value of 100 kΩ/sq. or less. The electrostatic discharge damage prevention film 2 is formed by sputtering using a gas obtained by adding a carbon dioxide gas and a nitrogen gas to an argon gas.</p> |
