发明名称 UPPER ELECTRODE DEVICE
摘要 An upper electrode device applied to the film coating process has a splitter chamber and at least three gas diversion plates; a gas inlet is set on the splitter chamber; the at least three gas diversion plates were fixed on the inside walls of the splitter chamber and used for diverting and outputting the gas introduced into the splitter chamber through the gas inlet. By using the upper electrode device provided by the present disclosure can uniformize the gas used for coating in the film coating process, especially uniformize the gas in the perimeter area and the center area. Consequently, the uniformity of the thickness of the whole film coated is improved.
申请公布号 US2014360601(A1) 申请公布日期 2014.12.11
申请号 US201414155089 申请日期 2014.01.14
申请人 EverDisplay Optronics (Shanghai) Limited 发明人 HSU Hsiuchi
分类号 B01D53/22 主分类号 B01D53/22
代理机构 代理人
主权项 1. An upper electrode device, comprising: a splitter chamber provided with a gas inlet; and at least three gas diversion plates fixed on inside walls of the splitter chamber for diverting and outputting the gas introduced into the splitter chamber through the gas inlet.
地址 Shanghai CN