发明名称 SEMICONDUCTOR DEVICE
摘要 A semiconductor device, including: a semiconductor layer; a first conductive layer formed above the semiconductor layer and having a first width; a second conductive layer connected to the first conductive layer and having a second width which is smaller than the first width; an interlayer dielectric formed above the first conductive layer and the second conductive layer; and an electrode pad formed above the interlayer dielectric. A connection section at which the first conductive layer and the second conductive layer are connected is disposed in a specific region positioned inward from a line extending vertically downward from an edge of the electrode pad; and a reinforcing section is provided at the connection section.
申请公布号 US2014361433(A1) 申请公布日期 2014.12.11
申请号 US201414467548 申请日期 2014.08.25
申请人 Seiko Epson Corporation 发明人 YUZAWA Takeshi;TAGAKI Masatoshi
分类号 H01L23/00 主分类号 H01L23/00
代理机构 代理人
主权项 1. A semiconductor device, comprising: a semiconductor layer; a first conductive layer formed above the semiconductor layer and having a first width; a second conductive layer connected to the first conductive layer and having a second width which is smaller than the first width; an interlayer dielectric formed above the first conductive layer and the second conductive layer; an electrode pad formed above the interlayer dielectric, a passivation layer formed above the electrode pad and having an opening which exposes at least part of the electrode pad; and a bump formed in the opening, a connection section at which the first conductive layer and the second conductive layer are connected being disposed in a specific region positioned inward and outward from a line extending vertically downward from an edge of at least part of the bump; and a reinforcing section being provided at the connection section.
地址 Tokyo JP