METHOD OF MANUFACTURING THE MULTI LAYER THIN FILM, THE MEMBER INCLUDING THE SAME, AND THE ELECTRONIC PRODUCT INCLUDING THE SAME

摘要

The present invention relates to a method for manufacturing a multilayered thin film using an apparatus to deposit a multilayered thin film to form a multilayered thin film by depositing a target particle, which is separated from a target due to plasma discharge, on a metal object; and a multilayered thin film. More specifically, the present invention relates to a sputtering deposition apparatus as an embodiment of the apparatus to deposit a multilayered thin film. According to an embodiment of the present invention, the method for manufacturing a multilayered thin film comprises: a step of coating a metal object with a coating layer; a step of depositing at least one hardness reinforcement layer on the coating layer; and a step of depositing a color layer on the hardness reinforcement layer.