发明名称 SPUTTERING TARGET FOR MAGNETIC RECORDING MEDIUM
摘要 A sintered sputtering target containing a Fe-Pt alloy and a non-magnetic material as the main components, said sintered sputtering target being characterized in that at least C (carbon) is contained as the non-magnetic material, an additional trace element other than the above-mentioned main components is contained in an amount of 50 to 5000 ppm by mass, and the standard free energy of formation (&Dgr;G°) of the additional trace element per 1 mole of carbon in a carbide is -5000 [cal/mol] or less. The present invention addresses the problem of providing a sputtering target which undergoes the formation of particles in a greatly reduced amount upon sputtering and contains a Fe-Pt alloy and a non-magnetic material as the main components.
申请公布号 WO2014196377(A1) 申请公布日期 2014.12.11
申请号 WO2014JP63676 申请日期 2014.05.23
申请人 JX NIPPON MINING & METALS CORPORATION 发明人 SATO ATSUSHI
分类号 C23C14/34;B22F3/00;B22F3/14;C22C1/05;C22C5/04;C22C32/00 主分类号 C23C14/34
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