| 摘要 |
Provided is a mask ROM which is capable of reducing the time required for the programming step and the subsequent steps (TAT) without causing an increase in the chip size. A semiconductor device which has two or more multilayer wiring layers, and wherein a contact plug (15c), which is formed uppermost among a plurality of contact plugs (15a-15c) that penetrate through interlayer insulating films (14a-14c), is composed of first contact plugs (15c1, 15c2), the upper surfaces of which are electrically connected to the uppermost wiring layer (14c), and a second contact plug (15c3) which is insulated from the uppermost wiring layer (14c) by means of an intervening thin first insulating film (19) that is formed on the upper surface of the second contact plug (15c3). The uppermost wiring layer (14c) is directly connected to the first contact plugs via an opening (20) that penetrates through the first insulating film (19), and is insulated from the second contact plug by covering the entire upper surface of the second contact plug with the first insulating film (19). |
