发明名称 |
METHOD FOR MANUFACTURING A MULTILAYER STRUCTURE ON A SUBSTRATE |
摘要 |
The invention relates to a method for manufacturing a multilayer structure on a first substrate made of a material having a first Young's modulus. The method includes: providing a second substrate covered with the multilayer structure, the multilayer structure having a planar surface opposite the second substrate, the second substrate being made of a material having a second Young's modulus; applying first deformations to said surface; molecularly boding the first substrate to said surface, the molecular bonding resulting in the appearance of second deformation in said surface in the absence of the first deformations, the first deformations being opposite the second deformations; and removing the second substrate, the resulting deformations in said surface being less than 5 ppm. |
申请公布号 |
US2014363951(A1) |
申请公布日期 |
2014.12.11 |
申请号 |
US201214369699 |
申请日期 |
2012.12.29 |
申请人 |
Commissariat à I'énergie atomique et aux energies alternatives |
发明人 |
Rossini Umberto;Elequet Raphaël;Flahaut Thierry |
分类号 |
H01L21/762 |
主分类号 |
H01L21/762 |
代理机构 |
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代理人 |
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主权项 |
1. A method of manufacturing a multilayer structure on a first support made of a first material having a first Young's modulus, the method comprising the successive steps of:
providing a second support covered with the multilayer structure, the multilayer structure having a planar surface opposite to the second support, the second support being made of a second material having a second Young's modulus different from the first Young's modulus; applying to said surface first deformations which vary according to the crystallographic directions of the second support; performing a molecular bonding of the first support onto said surface, the molecular bonding causing the occurrence of second deformations in said surface in the absence of the first deformations, the first deformations being opposite to the second deformations; and removing the second support, the resulting relative deformations in said surface being smaller than 5 ppm. |
地址 |
Paris FR |