发明名称 ZINC TARGET INCLUDING FLUORINE, METHOD OF FABRICATING ZINC NITRIDE THIN FILM BY USING THE SAME, AND METHOD OF FABRICATING THIN FILM TRANSISTOR BY USING THE SAME
摘要 Provided are fluorine-containing zinc targets, methods of fabricating a zinc oxynitride thin film by using the zinc targets, and methods of fabricating a thin film transistor by using the zinc oxynitride thin film. The methods include mounting a fluorine-containing zinc target and a substrate in a sputtering chamber, supplying nitrogen gas and inert gas into the sputtering chamber, and forming a fluorine-containing zinc oxynitride thin film on the substrate.
申请公布号 US2014363932(A1) 申请公布日期 2014.12.11
申请号 US201414187889 申请日期 2014.02.24
申请人 Samsung Electronics Co., Ltd. 发明人 RYU Myung-kwan;KIM Tae-sang;KIM Hyun-suk;PARK Joon-seok;PARK Young-soo
分类号 H01L29/66;C23C14/34 主分类号 H01L29/66
代理机构 代理人
主权项 1. A fluorine-containing sputtering zinc target comprising: a body including a mixture of zinc fluoride powder and zinc powder.
地址 Suwon-Si KR