| 摘要 |
<p>Provided are a polishing pad dresser, a manufacturing method thereof, polishing pad dressing device, and polishing system. The polishing pad dresser comprises: polishing particles which are polyhedrons and have a certain shape; and a basal body which has a polishing surface, wherein the polishing surface has a random roughness to make the polishing surface uneven, and the polishing particles are fixed to the polishing surface, and at least a portion of each of the polishing particles is buried in a dent on the polishing surface, and the edge of at least a portion of each polishing particle in the dent faces the polishing surface. The roughness of the polishing surface is increased, and the polishing particles can be buried in the dents on the polishing surface by using the polyhedral polishing particles with a certain shape, and the edge of at least a portion of each polishing particle in the dent faces the polishing surface. Polishing effects are improved because the edges of polishing particles face the polishing pad during polishing pad dressing using a polishing pad dresser. Moreover, the polishing particles have robustness preventing the polishing particles from breaking because the polishing particles have a certain shape. As a result, the probability of scratching a silicon slice caused by the cracking of diamond polishing particles can be reduced.</p> |
