ELECTRON BEAM INSPECTION SYSTEM

摘要

An electron beam inspection apparatus according to the present invention includes a plurality of electron beam columns, each of which is provided with an electron beam optical system that irradiates a sample surface with an electron beam and a detection system that detects an electron which is generated by the electron beam irradiation; and at least one transfer mechanism that is connected to the electron beam column. The electron beam column includes a cylindrical case that includes a large-diameter portion with a first outer diameter which accommodates the electron beam optical system and the detection system and a small-diameter portion with a second outer diameter which is smaller than the first outer diameter. The transfer mechanism is introduced to be connected to the electron beam column through a space which is formed outside by the small-diameter portion between the adjacent cylindrical cases.