发明名称 原版、及びそれを用いた物品の製造方法
摘要 <p>The original of the present invention has a pattern to be transferred. For example, the original of the present invention is a mold for use in an imprint apparatus or a mask for use in an exposure apparatus. The original has a negative effective Poisson's ratio. Alternatively, the original has an effective Poisson's ratio smaller than that of a quartz glass plate.</p>
申请公布号 JP5637785(B2) 申请公布日期 2014.12.10
申请号 JP20100198432 申请日期 2010.09.06
申请人 发明人
分类号 B29C33/38;B29C59/02;H01L21/027 主分类号 B29C33/38
代理机构 代理人
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