| 摘要 |
<p>The present invention relates to an apparatus to form a multilayered composite membrane capable of forming a multilayered composite membrane on an upper surface of a substrate, and to a method of forming a multilayered composite membrane using the same. The apparatus to form a multilayered composite membrane comprises: an atomic layer deposition device which includes a transferring means transferring a substrate, a reaction chamber having an opening formed on one side thereof to expose the substrate, and a gas supplying means rotating by arranging a plurality of gas storing cells in a widthwise direction of the substrate to supply gas to the substrate when the gas storing cells are successively connected with the opening, wherein the gas storing cells store various gases including reaction gas supplied from the outside; and a flowing membrane deposition device which includes a transferring means transferring the substrate, a reaction chamber which has an opening on one side thereof to expose the substrate to the outside such that the substrate being transferred by the transferring means is deposited with a membrane, and a reaction material supplying means which supplies a reaction material to the substrate through the opening to generate a deposition reaction. The atomic layer deposition device and the flowing membrane deposition device are alternately arranged to continuously and quickly form a multilayered composition membrane on the upper surface of the substrate. Therefore, the apparatus to form a multilayered composite membrane and the method to form a multilayered composite membrane using the same can protect organic matter of an element installed in the substrate from outside oxygen or water, prevents the multilayered composite membrane from being cracked or broken when the substrate is bent or curved, and can uniformly perform coating on the substrate even if fine dusts or impurities are on the substrate before the deposition of the multilayered composite membrane.</p> |
