| 摘要 |
The present invention relates to a method for producing a silica glass substrate for an imprint mold, containing: obtaining a glass body from a glass-forming raw material containing an SiO 2 precursor; machining the glass body into a glass substrate having a predetermined shape; and removing an affected layer on a surface of the glass substrate, to produce a silica glass substrate for an imprint mold having a fictive temperature distribution in a region from the surface to a depth of 10 µm on the side to be subjected to a transfer pattern formation of the glass substrate being within ±30°C. |
