发明名称 |
Micromachined thermal mass flow sensor and manufacturing method thereof |
摘要 |
<p>The present invention concerns a gas flowmeter comprising: a semiconductor substrate (2) including a cavity (9); an insulating film (7b) formed above said semiconductor substrate (2) so that said cavity (4) is covered with said insulating film (7b); and a heat element (4), temperature measuring resistors (5a-5d) and wiring connection portions (11c-11l) each formed on said insulating film (7b); said heat element (4), said temperature measuring resistors (5a-5d) and said wiring connection portions (11c-11l) each being an impurity-doped polycrystalline silicon semiconductor thin film (23). Said impurity-doped polycrystalline silicon semiconductor thin film (23) provides a resistivity of 8 x 10 -4 ©cm or less.</p> |
申请公布号 |
EP2811265(A1) |
申请公布日期 |
2014.12.10 |
申请号 |
EP20140171282 |
申请日期 |
2002.10.16 |
申请人 |
HITACHI, LTD.;HITACHI CAR ENGINEERING CO., LTD. |
发明人 |
YAMADA, MASAMICHI;HORIE, JUNICHI;WATANABE, IZUMI;NAKADA, KEIICHI |
分类号 |
G01F1/684;F02D35/00;G01F1/692 |
主分类号 |
G01F1/684 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|