发明名称 Apparatus for laser induced thermal imaging (LITI) and LITI method using the same, as well as fabrication method of a corresponding LITI mask
摘要 A mask for LITI and a LITI method using the same wherein the mask includes patterns arranged in a direction perpendicular to a beam scanning direction and are arranged so that increasingly longer patterns are located towards the edge of the mask than in or near the center, and having center axes aligned to corresponding center axes of image patterns formed on a substrate.
申请公布号 EP1757978(B1) 申请公布日期 2014.12.10
申请号 EP20060254461 申请日期 2006.08.25
申请人 SAMSUNG DISPLAY CO., LTD. 发明人 KANG, TAE-MIN;LEE, JAE-HO;LEE, SEONG-TAEK
分类号 G03F1/36;G03F1/00;H01L27/32;H01L51/00 主分类号 G03F1/36
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