发明名称 無機高分子を使用するスパッタリング用ターゲットの製造方法
摘要 The Invention relates to a cathodic sputtering target composition comprising at least a solid electrolyte and an inorganic carbon free polymer and to a method for the manufacturing of cathodic solid sputtering targets using such a composition. The invention also relates to solid sputtering targets obtained by such a method and to their use for the preparation of solid thin films by a sputtering physical vapour deposition process, in particular for the preparation of solid electrolyte thin films inside thin-film batteries.
申请公布号 JP5638519(B2) 申请公布日期 2014.12.10
申请号 JP20110514145 申请日期 2009.06.17
申请人 发明人
分类号 C23C14/34;C04B35/00;C04B35/63;H01B13/00;H01M6/18 主分类号 C23C14/34
代理机构 代理人
主权项
地址