发明名称 RESIN COMPOSITION FOR ETCHING
摘要 The present invention relates to a resin composition for etching used for protecting a plate glass from surface scratch, damage of edge caused by water-jet, and mechanical stimulation generated when preparing tempered glass used in a touch panel, and more specifically, to a resin composition for etching, which has excellent acid resistance such as hydrofluoric acid and can be easily detached by using an alkali solution. The purpose of the present invention is to provide a composition for protecting a surface of tempered glass having wear resistance and etching resistance including a styrene-acrylic acid copolymer, a hydroxy(meta)acrylic monomer, a polyfunctional (meta)acrylic monomer, a photoinitiator, and an inorganic filler.
申请公布号 KR20140141510(A) 申请公布日期 2014.12.10
申请号 KR20140065530 申请日期 2014.05.30
申请人 HANBAT NATIONAL UNIVERSITY INDUSTRY-ACADEMIC COOPERATION FOUNDATION 发明人 LEE, CHUL WOO;YANG, JEE WOO;SEO, AH YOUNG
分类号 C03C17/32;C09D125/14 主分类号 C03C17/32
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