| 摘要 |
The present invention is an imprint apparatus forming patterns on a plurality of shot regions on a substrate, and provides an imprint apparatus which comprises: a heating unit configured to heat a substrate to respectively deform shot regions; and a control unit configured to control the heating unit. The control unit controls heating of the substrate by the heating unit in such a way that a shape of a target shot region deformed by a heating of the substrate according to control information is converged to a target shape when a target shot region, which is a shot region to be imprinted, is imprinted based on the heating control information which was used to heat a shot region imprinted before the target shot region by the heating unit. |
