发明名称 |
COATING APPARATUS AND METHOD OF CLEANING SEALING UNIT |
摘要 |
<p>The present invention relates to a method of property removing coating liquid attached to a sealing unit that seals a discharge port of a slit nozzle. A coating apparatus according to the embodiment includes: a slit nozzle; a moving mechanism; a sealing unit; a solvent reservoir; and an immersing mechanism. The slit nozzle is provided with a discharge port at a lower side of the slit nozzle, and configured to discharge a coating liquid from the discharge port. The moving mechanism is configured to move the slit nozzle relative to a substrate. The sealing unit is formed to extend along a longitudinal direction of the discharge port, and includes a top surface which is brought into contact with the discharge port to seal the discharge port. The solvent reservoir is configured to retain a solvent. The immersing mechanism is configured to immerse the sealing unit into the solvent retained in the solvent reservoir.</p> |
申请公布号 |
KR20140140492(A) |
申请公布日期 |
2014.12.09 |
申请号 |
KR20140060399 |
申请日期 |
2014.05.20 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
MAKI TETSUYA;TANOUE HAYATO |
分类号 |
H01L21/302;H01L21/08;H01L21/56;H01L21/677 |
主分类号 |
H01L21/302 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|