发明名称 COATING APPARATUS AND METHOD OF CLEANING SEALING UNIT
摘要 <p>The present invention relates to a method of property removing coating liquid attached to a sealing unit that seals a discharge port of a slit nozzle. A coating apparatus according to the embodiment includes: a slit nozzle; a moving mechanism; a sealing unit; a solvent reservoir; and an immersing mechanism. The slit nozzle is provided with a discharge port at a lower side of the slit nozzle, and configured to discharge a coating liquid from the discharge port. The moving mechanism is configured to move the slit nozzle relative to a substrate. The sealing unit is formed to extend along a longitudinal direction of the discharge port, and includes a top surface which is brought into contact with the discharge port to seal the discharge port. The solvent reservoir is configured to retain a solvent. The immersing mechanism is configured to immerse the sealing unit into the solvent retained in the solvent reservoir.</p>
申请公布号 KR20140140492(A) 申请公布日期 2014.12.09
申请号 KR20140060399 申请日期 2014.05.20
申请人 TOKYO ELECTRON LIMITED 发明人 MAKI TETSUYA;TANOUE HAYATO
分类号 H01L21/302;H01L21/08;H01L21/56;H01L21/677 主分类号 H01L21/302
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