Temperature controlled loadlock chamber

摘要

A temperature controlled loadlock chamber for use in semiconductor processing is provided. The temperature controlled loadlock chamber may include one or more of an adjustable fluid pump, mass flow controller, one or more temperature sensors, and a controller. The adjustable fluid pump provides fluid having a predetermined temperature to a temperature-controlled plate. The mass flow controller provides gas flow into the chamber that may also aid in maintaining a desired temperature. Additionally, one or more temperature sensors may be combined with the adjustable fluid pump and/or the mass flow controller to provide feedback and to provide a greater control over the temperature. A controller may be added to control the adjustable fluid pump and the mass flow controller based upon temperature readings from the one or more temperature sensors.

主权项

1. A loadlock assembly for semiconductor processing, the loadlock assembly comprising:
a loadlock chamber having sidewalls, a top, a bottom, and a plurality of openings through which access may be gained to the loadlock chamber; a temperature-controlled plate within the loadlock chamber, the temperature-controlled plate having a first intake port and a first output port; a chiller having a second output port coupled to the first intake port and a second intake port coupled to the first output port, the chiller having an adjustable temperature within a range of temperatures at which the chiller may provide cooling fluid to the temperature-controlled plate via the second output port and the first intake port; a mass flow controller configured to provide gas to an interior region of the loadlock chamber; one or more temperature sensors on a at least one of the sidewalls, the top, or the bottom of the loadlock chamber and within and exposed to the interior region of the loadlock chamber, the one or more temperature sensors being above the temperature-controlled plate, the one or more temperature sensors being configured to measure a temperature of a wafer on the temperature-controlled plate as one or more temperature samples; and a controller communicatively coupled to the one or more temperature sensors and to the chiller, the controller being configured to adjust the adjustable temperature based at least in part on the one or more temperature samples of the wafer received from the one or more temperature sensors, wherein the controller is configured to adjust a flow rate of the gas supplied by the mass flow controller based at least in part on the one or more temperature samples of the wafer received from the one or more temperature sensors.