发明名称 Donor substrate, method for fabricating the donor substrate, and method for forming transfer pattern using the donor substrate
摘要 A donor substrate may include a base layer, a light-to-heat conversion layer disposed on the base layer, a buffer layer disposed on the light-to-heat conversion layer and including a composite layer of titanium dioxide and polytetrafluoroethylene, and a transfer layer disposed on the buffer layer. The buffer layer may be disposed between the transfer layer and the light-to-heat conversion layer. The buffer layer may be cleaned by incident light to preserve or improve its hydrophobicity. Accordingly, the buffer layer can be easily separated from the transfer layer. Advantageously, when (a portion of) the transfer layer is transferred onto a target substrate, unwanted material transfer may be prevented.
申请公布号 US8906723(B1) 申请公布日期 2014.12.09
申请号 US201314017102 申请日期 2013.09.03
申请人 Samsung Display Co., Ltd. 发明人 Kwon YoungGil
分类号 H01L21/00;H01L21/46;H01L29/18;H01L33/00;H01L51/00;H01L51/56 主分类号 H01L21/00
代理机构 Innovation Counsel LLP 代理人 Innovation Counsel LLP
主权项 1. A donor substrate comprising: a base layer; a light-to-heat conversion layer disposed on the base layer; a buffer layer disposed on the light-to-heat conversion layer and including a composite layer of titanium dioxide and polytetrafluoroethylene; and a transfer layer disposed on the buffer layer, wherein the buffer layer is disposed between the transfer layer and the light-to-heat conversion layer.
地址 KR