发明名称 Cold field electron emitters based on silicon carbide structures
摘要 A cold cathode field emission electron source capable of emission at levels comparable to thermal sources is described. Emission in excess of 6 A/cm2 at 7.5 V/μm is demonstrated in a macroscopic emitter array. The emitter is comprised of a monolithic and rigid porous semiconductor nanostructure with uniformly distributed emission sites, and is fabricated through a room temperature process which allows for control of emission properties. These electron sources can be used in a wide range of applications, including microwave electronics and x-ray imaging for medicine and security.
申请公布号 US8907553(B2) 申请公布日期 2014.12.09
申请号 US201213569245 申请日期 2012.08.08
申请人 The United States of America as represented by the Secretary of Commerce, The National Institute of Standards and Technology 发明人 Sharifi Fred;Kang Myung-Gyu;Lezec Henri
分类号 H01J9/02;H01J1/00;H01J1/304 主分类号 H01J9/02
代理机构 Rankin, Hill & Clark LLP 代理人 Bandy Mark E.;Rankin, Hill & Clark LLP
主权项 1. A field emitter having a plurality of discrete emission projections extending from an emission face of the field emitter, the field emitter being monolithic and homogenous in a direction transverse to the emission face of the field emitter, wherein the emitter achieves an emission current density greater than 1 A/cm2 at an applied macroscopic electric field of 3 V/μm.
地址 Washington DC US