发明名称 |
Multi charged particle beam writing apparatus and multi charged particle beam writing method |
摘要 |
In accordance with one aspect of this invention, a multi charged particle beam writing apparatus includes an aperture member, in which a plurality of openings are formed, configured to form multi-beams by making portions of the charged particle beam pass through the plurality of openings; a plurality of blankers configured to perform blanking-deflect regarding beams corresponding to the multi-beams; a writing processing control unit configured to control writing processing with a plurality of beams having passed through different openings among the plurality of openings being irradiated on the target object at a predetermined control grid interval; and a dose controlling unit configured to variably control a dose of a beam associated with deviation according to a deviation amount when an interval between the plurality of beams irradiated is deviated from the control grid interval. |
申请公布号 |
US8907306(B2) |
申请公布日期 |
2014.12.09 |
申请号 |
US201414199535 |
申请日期 |
2014.03.06 |
申请人 |
NuFlare Technology, Inc. |
发明人 |
Yoshikawa Ryoichi;Ogasawara Munehiro |
分类号 |
H01J37/302;H01L21/263;H01J37/317 |
主分类号 |
H01J37/302 |
代理机构 |
Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P. |
代理人 |
Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P. |
主权项 |
1. A multi charged particle beam writing method, comprising:
emitting a charged particle beam; receiving irradiation of the charged particle beam on a region including all of a plurality of openings of an aperture member in which the plurality of openings are formed and forming multi-beams by making portions of the charged particle beam pass through the plurality of openings; performing writing processing with a plurality of beams having passed through different openings among the plurality of openings being irradiated on a target object at a predetermined control grid interval; and variably controlling each dose of the plurality of beams associated with a deviation of an interval between the plurality of beams irradiated, from the control grid interval according to a deviation amount of the interval between the plurality of beams irradiated when the interval between the plurality of beams irradiated is deviated from the control grid interval. |
地址 |
Yokohama JP |