发明名称 Method of encapsulation of a microcomponent
摘要 A method for encapsulating a microcomponent positioned on a substrate, including: a) production of an electrical contact pad on the substrate; b) production of a portion of sacrificial material covering the microcomponent and the electrical contact pad; c) production of an encapsulation layer covering the sacrificial material and a first face of the substrate; d) production, through the substrate, of a hole aligned with the electrical contact pad and emerging at the portion of sacrificial material; e) elimination of the portion of sacrificial material through the hole; f) production, in the hole, of a conductive portion electrically connected to the electrical contact pad, forming a conductive via.
申请公布号 US8906750(B2) 申请公布日期 2014.12.09
申请号 US201213977897 申请日期 2012.01.02
申请人 Commissariat a l'energie atomique et aux energies alternatives 发明人 Jacquet Fabrice;Henry David
分类号 H01L21/00;B81C1/00;B81B7/00 主分类号 H01L21/00
代理机构 Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P. 代理人 Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
主权项 1. A method of encapsulating at least one microcomponent positioned on a first face of a substrate and/or in the substrate, comprising: a) production of at least one electrical contact pad on the first face of the substrate; b) production of at least one portion of sacrificial material covering at least the microcomponent and at least a part of the electrical contact pad; c) production of at least one thick encapsulation layer covering the portion of sacrificial material, and at least a part of the first face of the substrate; d) production, through a second face, opposite the first face, of the substrate of at least one first hole aligned at least partially with the electrical contact pad, and emerging at the portion of sacrificial material; e) elimination of the portion of sacrificial material through the first hole; f) production, at least in the first hole, of at least one portion of electrically conductive material electrically connected to the electrical contact pad, forming a first conductive via.
地址 Paris FR