| 摘要 |
A negative photosensitive resin composition having good resolution and balance of time concerning pattern formation, an electronic device, and a polymer are provided. A negative photosensitive resin composition including a polymer of an organic group having 2 to 18 carbon atoms and a repeating unit represented by the following (1) and (2a), where R_5 in Formula (2a) has a radical polymerizable group, and a photo radical polymerization initiator, is provided. (In Formula (1), R_1, R_2, R_3 and R_4 are each independently hydrogen or an organic group having 1 to 30 carbon atoms. n is 0, 1 or 2.). |
