Exposure method for color filter substrate

摘要

An exposure method for color filter substrate is provided. As shown in FIG. 7(a), exposure is performed while a substrate 20 to which a photoresist has been applied is being transported in the Y direction, to simultaneously form first layers 81 and layers 91 in first non-display regions 51 (regions indicated by hatching sloping upward to the right) and the display region, respectively, on the substrate 20. Next, as shown in (b), the substrate 20 is rotated by 90 degrees, and exposure is performed while the substrate 20 is being transported in the X direction, to form second layers 82 in second non-display regions 52 (regions indicated by hatching sloping upward to the right). Thus, dummy PSs 71 and dummy PSs 72 arranged with desired pitches and having desired shapes can be formed in the first non-display regions 51 and the second non-display regions 52, respectively.

主权项

1. An exposure method for a color filter substrate having: a rectangular display region which has a pair of sides extending in a first direction and a pair of sides extending in a second direction orthogonal to the first direction and in which a plurality of colored pixels and a plurality of photo spacers (PSs) are provided; a pair of first non-display regions which are respectively along the sides extending in the first direction and in which a plurality of dummy photo spacers (dummy PSs) are provided; and a pair of second non-display regions which are respectively along the sides extending in the second direction and in which a plurality of dummy photo spacers (dummy PSs) are provided, the exposure method comprising:
forming a first layer included in a first dummy PS in the first non-display region by applying light, a plurality of times intermittently, on a substrate to which a photoresist has been applied while simultaneously transporting the substrate in the first direction; and forming a second layer included in a second dummy PS in the second non-display region by applying light, a plurality of times intermittently, on the substrate to which the photoresist has been applied while simultaneously transporting the substrate in the second direction, wherein the forming the first layer and the forming the second layer are carried out in an arbitrary order, and the first layer and the second layer are composed of a material different from a material of the colored pixels.