发明名称 METHOD FOR FORMING THIN FILM AND THIN FILM
摘要 <p>PROBLEM TO BE SOLVED: To provide a method for forming a thin film capable of stably forming the thin film excellent in uniformity of film thickness.SOLUTION: The method for forming a thin film is a method for discharging coating liquid 80 from a die head 2 toward a base material 90 conveyed by conveyance means, and forming a thin film 82. The die head 2 includes: an upstream lip 21 located upstream in a conveyance direction of the base material 90, and having an outer side surface part 211, a slit-side side surface part 212 and a land part 213; a downstream lip 22 located downstream in the conveyance direction of the base material 90, and having an outer side surface part 221, a slit-side side surface part 222 and a land part 223; and a slit part 23 located between the upstream lip 21 and the downstream lip 22. The control is performed so that an upstream end of beads 81 of the coating liquid 80 supplied from the die head 2 is located on an upstream edge of the land part 213 of the upstream lip 21.</p>
申请公布号 JP2014226620(A) 申请公布日期 2014.12.08
申请号 JP20130109264 申请日期 2013.05.23
申请人 SUMITOMO BAKELITE CO LTD 发明人 UDAKA KENJI;KIYOMITSU CHISA
分类号 B05D1/26 主分类号 B05D1/26
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