| 摘要 |
<p>A method for manufacturing a solar cell using an ion implanting method is provided. The method for manufacturing the solar cell according to one aspect comprises a preparation process of preparing for a substrate for the solar cell having a first conduction type silicon layer and a coated film covering the silicon layer; and an emitter layer forming process of forming an emitter layer on a partial area of a light receiving surface of the silicon layer by scanning a second conduction type ion toward the silicon layer via the coated film. In the emitter layer forming process, the ion is scanned with energy making an ion arrival distance become a distance from a surface of the coated film to an interface between the coated film and the silicon layer.</p> |
